Beilstein J. Nanotechnol.2021,12, 633–664, doi:10.3762/bjnano.12.52
; focused helium ion beam-induced deposition; focused helium ion beam milling; helium ion beam lithography; heliumionimplantation; Introduction
Since the helium ion microscope (HIM) was introduced 15 years ago [1][2][3], over one hundred HIMs have been installed worldwide and over one thousand research
piezoelectricity has been patterned into multilayered MoTe2 [56]. In the case of helium ion irradiation of a bulk van der Waals layered ferroelectric semiconductor crystal (CuInP2S6), local volume expansion due to heliumionimplantation was observed, forming a conical surface topography within which for
overall damage evolution process was also noted.
2 Ion implantation
Heliumionimplantation and the associated structural changes to a material are often unwanted, with measures taken to avoid these effects. However, the HIM also offers a unique opportunity for fundamental studies of heliumion
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Figure 1: (a) Schematic diagram of the helium ion microscope. Adapted with permission from Cambridge Universi...
Beilstein J. Nanotechnol.2012,3, 579–585, doi:10.3762/bjnano.3.67
the lamella. The purpose of this exposure geometry was to produce a wedge shape of silicon within the lamella so that we could observe the minimum thickness dimensions which can be fabricated by HIM. It also allows us to analyze the subsurface modification effects due to heliumionimplantation. All
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Figure 1:
(a) SEM image of the silicon lamella (sample 1) after FIB preparation. (b) HAADF TEM image of the s...